Abstract
TWINSCAN NXE:3800E — EUV lithography systems (ASML product page) & Tom's Hardware delivery report. Fetched by the auto-model research pass; the figures below are cited from this source in the model's flow, idiot-index, energetic-index, and market tabs.
Key facts
- NXE:3800E (3rd-gen Low-NA EUV) for 2nm and beyond
- ~195 wph initially, up to 220 wph (30% over NXE:3600D's 160 wph)
- Estimated ~$180M per unit
Reviewer note
Real source gathered during the extend-silicon-stack research pass (2026-06-21). Figures attributed to it in the model link back here.